Abstract
Large-area periodically aligned silicon nanopillar (PASiNP) arrays were fabricated by magnetic sputtering with glancing angle deposition (GLAD) on substrates coated by a monolayer of close-packed polystyrene (PS) nanospheres. The structure of PASiNP arrays could be manipulated by changing the diameter of PS nanospheres. Enhanced light absorptance within a wavelength range from 300 to 1,000 nm was observed as the diameter of nanopillars and porosity of PASiNP arrays increased. Meanwhile, Xe ion irradiation with dose from 1 × 1014 to 50 × 1014 ions/cm2 was employed to modify the surface morphology and top structure of thin films, and the effect of the irradiation on the optical bandgap was discussed.PACS code81.15.Cd; 78.66.Jg; 61.80.Jh
Highlights
With the development of society, problems of energy crisis and environment pollution have been of further concern
In 1976, Carlson and Wronski [1] invented a new type of thin film solar cell that utilized amorphous silicon (a-Si) deposited from a glow discharge in silane (SiH4) and achieved a power conversion efficiency of 2.4% in AM-1 sunlight
PS nanospheres were selfassembled into a monolayer, and a highly ordered area of about 50 μm2 was obtained
Summary
With the development of society, problems of energy crisis and environment pollution have been of further concern. In order to maintain sustainable growth, a clean and renewable energy source is urgently required. Among all new types of energy sources, solar energy is the most promising one for it is safe, cheap, inexhaustible, and environment-friendly. In 1976, Carlson and Wronski [1] invented a new type of thin film solar cell that utilized amorphous silicon (a-Si) deposited from a glow discharge in silane (SiH4) and achieved a power conversion efficiency of 2.4% in AM-1 sunlight. Compared with conventional solar cell, amorphous silicon thin film solar cell is low cost and could be deposited on various substrates such as glass, stainless steel, ceramic plate, and plastic [3]
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