Abstract
TiO2 films were deposited on glass substrates with and without O2 plasma etching by using the RF-magnetron sputtering method. We focused on the effect of surface structure on the photoinduced hydrophilic properties of TiO2 films, fabricated on different surface conditions according to the presence or absence of the O2 plasma treatment on glass substrates. The wettability and photoinduced hydrophilic properties of the TiO2 films were investigated according to the changes in water contact angles under UV light irradiations with a very low intensity of 0.1 mW/cm 2 . The photoinduced hydrophilic properties on the TiO2 formed above the plasma treated glass were also superior to those on the TiO2 formed above the bare glass. This enhanced TiO2 film has been used practically for self cleaning and anti-fogging glasses.
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