Abstract
Two-photon interferometric quantum photon lithography for light of wavelength \ensuremath{\lambda} is capable of beating the Rayleigh diffraction limit of resolution \ensuremath{\lambda}/4 to the level of \ensuremath{\lambda}/8. The required twin single-photon states $|1{〉}_{a}|1{〉}_{b},$ which are converted into maximally entangled states by a 50:50 beam splitter, can be generated from a nondegenerate parametric amplifier initially in vacuum states and with a weak pump field. Increasing the pump strength can slightly increase the production rate of the desired state and it will also increase the production of the twin two-photon states $|2{〉}_{a}|2{〉}_{b},$ which leads to an unwanted background term. In this paper we show that, assuming a weak pair coherent state as input to the amplifier, quantum interference can be used to quench the production of the $|2{〉}_{a}|2{〉}_{b}$ state and to enhance the production of the $|1{〉}_{a}|1{〉}_{b}$ state by almost sixfold.
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