Abstract
The resistance of polycrystalline divalent-ion-doped LaMnO 3 has been shown to be highly sensitive to low magnetic fields. To enable direct study of the properties of isolated grain boundaries, we developed a new method to form artificial boundaries in manganite thin films. Metal slits about 70 nm in width were printed by 30 KV focused Ga ion beam nanolithography on a 4 μ m La 2 / 3 Sr 1 / 3 MnO 3 bridge, and the materials in these slits were then irradiated by accelerated H 2 + ions. Using this method, magnetoresistance (MR) > 8 % and > 16 % were, respectively, obtained at 150 and at 10 K in a magnetic field of 1 T. This technique is very promising in terms of its simplicity and flexibility of fabrication and has the potential for high-density integration.
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