Enhanced energy storage performance in Bi4Ti3O12 thin films with oxygen depletion layers

Abstract

The imprint effect in ferroelectric materials can significantly enhance the performance of energy storage devices. Bi4Ti3O12 (BTO) and oxygen-deficient Bi4Ti3O11.2 (DBTO) thin films were deposited on single-crystal Nb-doped SrTiO3 substrates using pulsed laser deposition. In stark contrast, multilayer DBTO/BTO thin films incorporating an oxygen-deficient layer were also fabricated, with the DBTO layers having thicknesses of 5 nm and 10 nm, respectively. Both BTO and DBTO thin films exhibited epitaxial growth and c-axis-oriented crystallinity. Regarding ferroelectric properties, DBTO/BTO capacitors with an oxygen-deficient layer demonstrated a pronounced imprint effect in their ferroelectric hysteresis loops, compared to the BTO and DBTO capacitors. This effect was particularly noticeable in the DBTO/BTO capacitor with a 10 nm oxygen-deficient layer, as opposed to the thin film with a 5 nm oxygen-deficient layer. We suggest that the imprint effect can be attributed to localized electric field variations and imbalances in charge transport at the interface between the oxygen-depleted layer and the remaining thin film. Consequently, the imprint effect observed in the DBTO/BTO capacitors contributed to an enhancement in energy storage density and efficiency, compared to BTO and DBTO capacitors. This study demonstrates the potential of multilayer DBTO/BTO thin films in advancing capacitive energy storage systems.