Abstract

We propose a highly transparent polysilicon oxide (poly-SiOx)/crystalline silicon (c-Si) front passivation contact (poly-SiOx/c-Si) to overcome the parasitic current drawback and enhance the stability of silicon heterojunction (SHJ) solar cells. Poly-SiOx has a mixed-phase crystalline structure with large crystalline grains embedded in a wide-gap amorphous silicon oxide (a-SiOx) matrix, resulting in a quantum confinement effect. While the large crystalline phase facilitates dopant activation toward high conductivity (elevated Fermi level), resulting in substantial band bending at the c-Si/poly-SiOx interface for additional field-effect passivation, the a-SiOx matrix allows additional chemical surface passivation. Thus, passivation quality with an implied open-circuit voltage of 732 mV and a recombination current density of 4.3 fA/cm2 was achieved. Owing to the interaction between the quantum confinement effect and the wide-gap a-SiOx phase, the mixed-phase structure had a wide bandgap (1.98 eV), significantly increasing the absorption of the device in the short-wavelength region (≤500 nm). A hybrid rear-emitter SHJ solar cell using poly-SiOx/c-Si achieved an efficiency of 23.95% with Voc = 723 mV, a short-circuit current density of 40.9 mA/cm2, and a fill factor of 81%.

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