Enhanced electromagnetic wave absorption performance of Ta₄C₃Tx MXenes with optimized interlayer spacing via hydrofluoric acid etching

Abstract

Ta4C3Tx MXene, a novel two-dimensional material, shows significant application potential for electromagnetic wave (EMW) absorption because of its unique layered structure and high conductivity. In this study, hydrofluoric acid etching was used to obtain Ta4C3Tx MXenes with varying interlayer spaces by adjusting the etching duration, which enhanced the EMW absorption performance. The impact of interlayer spacing on the EMW absorption performance of Ta4C3Tx MXene was systematically evaluated for the first time. The results show that the sample etched with hydrofluoric acid for 48 h (S2-48 h) exhibited the best EMW absorption performance. For S2-48 h, the optimal reflection loss (RL) value was −33.53 dB at a frequency of 9.74 GHz and a thickness of 1.4 mm. In addition, the widest effective absorption bandwidth was 2.97 GHz (10.73–13.7 GHz), which was achieved at a frequency of 11.72 GHz and a thickness of 1.2 mm. This outstanding performance is mainly attributed to good impedance matching and multiple loss mechanisms induced by the etching process, including conduction loss, dipolar polarization, interfacial polarization, and multiple RLs. Furthermore, this research expands the application potential of two-dimensional MXene materials in EMW absorption.