Abstract
The cutoff frequency performance of an NPN Si/SiGe/SiGe single-heterojunction bipolartransistor (SiGe SHBT) at high collector current densities has been analysed using a 2-D MEDICIdevice simulator. A conventional NPN Si/SiGe/Si double-heterojunction bipolar transistor(SiGe DHBT) having uniform 20 atomic per cent of germanium in the base region has beeninvestigated for comparison. The analysis shows the formation of a retarding potential barrierfor minority carrier electrons at the base-collector heterojunction of the DHBT structure. Whereas,the base-collector homojunction of the SiGe SHBT structure, having a uniform 15 atomic percent of germanium profile in its base and collector, inhibits the formation of such a retardingpotential barrier, the SHBT structure with a base-collector homojunction shows an improvedcutoff frequency at high collector current density in comparison with conventional SiGe DHBT,which makes it more promising for high speed, scaled down, field-specific applications.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
