Abstract
A Mather-type plasma focus device is used in this work which is prefilled with helium at 0.8 Torr. The total ion current density of the plasma stream is measured to be 750 mA/cm2. From time-resolved measurements (Faraday cup), the ion beam energy was distributed with energy ranging from 0.3 to 540 keV. The ion flux density of ion beam is estimated to be 4.47 × 1011 ion/steradian using track etching technique (LR-115A). Key words: Energetic ions, plasma focus, charging voltage.
Highlights
Ion diagnostics of high-temperature plasma objects are considered to be very important, because they provide essential data about plasma parameters
Experimental studies of Dense Plasma Focus (DPF) facilities proved the occurrence of high-energy ion beams, generated within the plasma focus pinch column or its vicinity
High energetic ions are considered to play an important role in the production of the intense neutron flux in the plasma focus device when using deuterium gas (Zakaullah et al, 1999)
Summary
Ion diagnostics of high-temperature plasma objects are considered to be very important, because they provide essential data about plasma parameters. Ion beams are emitted from the high-temperature plasma objects are an abundant source of valuable information about fusion reaction yields, plasma ion temperatures, as well as a spatial distribution of fusion reaction sources. Experimental studies of Dense Plasma Focus (DPF) facilities proved the occurrence of high-energy ion beams, generated within the plasma focus pinch column or its vicinity. Studies of high-energy ions emitted from plasma focus devices provide information on the ion acceleration mechanisms and are important for various plasma focus technology. Track etching technique has been successfully employed in many insulating materials for detection and identification of charged particles, e.g. in the study of heavy primary cosmic rays, the search for super heavy elements and innumerable applications in radiation dosimeters.
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