Abstract
Double barrier resonant tunnelling structures consisting of silicon quantum dots (QDs) in silicon dioxide ( SiO 2 ) matrix have been studied for Energy Selective Contacts for Hot Carrier solar cell. A single layer of silicon QDs has been fabricated by high temperature annealing of SiO 2 / Si-rich oxide (SRO)/ SiO 2 layers deposited by RF magnetron sputtering. Compositional analysis of SRO films obtained with different sputtering target has been accurately measured with Rutherford backscattering spectroscopy. Size-controlled growth of Si QDs has been studied with photoluminescence measurements which demonstrate that QD sizes can be controlled with SRO layer thickness. In addition, resonant tunnelling behaviour of SiO 2 / Si QD/ SiO 2 structures has been investigated.
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