Year-end Sale % OFF 
Abstract
This work presents the physics and technology of a micromechanically fabricated “energy filter” for doping applications. This energy filter is capable of producing pre-defined tailored doping profiles by a single monoenergetic ion implantation. The functional principle of the energy filter is explained using a simple model. Pattern transfer is being investigated for two different filter-substrate distances. Different aspects of the filter’s temperature behavior during irradiation are discussed. Finally, the results of an entire wafer area implantation are presented and discussed.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callMore From: Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
