Abstract
Abstract In this paper emphasis is laid upon the energy deposition calculations of 0.3–0.6 MeV low-energy electrons in multilayer media. In addition the energy depositions of 0.2–3.0 MeV electrons in some materials have been calculated by the bipartition model of electron transport. The calculation results are in agreement with some experimental data. The energy deposition values of 0.3–0.6 MeV electrons have been fitted into an approximate calculation formula which can be used for dose measurements and calculations of low-energy electron beam radiation curing and film material radiation processing.
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