Abstract
The demand for higher functionality devices drives integration technologies in the third dimension to overcome limitations in Moore's Law. One popular example for 3D Integration is Package-on-Package (PoP), where memory stacks are mounted above the processor. Heterogeneous Integration (HI) is one of the key technologies to meet future fan-out (FO) application standards using higher bandwidths and higher chip-to-chip interconnection density or IO density. However, HI brings new challenges like large-area panel production and design limitations. Fast increasing package size in combination with insufficient increase in stepper reticle size is inhibiting designs for large packages and HI applications. A solution which provides limitless design and fine resolution patterning capabilities is a full-field projection scanner. For next generation FO applications, a projection scanner provides superior performance compared to a stepper by enabling limitless design, allowing dies of any size and patterning of non-repeated features at higher throughput and lower cost. This paper presents technical challenges and provides solutions for future HI FO applications, using a full-field exposure system for large package integration, eliminating low yielding stitching steps. High accuracy overlay, fine resolution for RDL routing and large depth of focus (DOF) for thick resist applications with high aspect ratio is demonstrated. The extendibility to large panel packaging integration is discussed.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.