Abstract
DLC films were deposited on polished both n-type and p-type silicon substrates. The silicon resistivity was ∼0.02 Θ cm. Some of the DLC films 20 nm thick were deposited on the n-type Si surface with the submicron cones. SEM and Raman spectroscopy were used for structural investigations. Field electron emission occurs after dielectric breakdown, except for the samples with Si cones for which the emission seems to originate from SiC formed during the first stage of electron emission. It seems that too much sp2 graphite phase may give rise to the observed increase in the turn-on field from 50 V/μm up to 150 V/μm.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
