Abstract
Macroscopic graphene films buried below amorphous and crystalline silicon capping layers are studied by Raman backscattering spectroscopy and Hall-effect measurements. The graphene films are grown by chemical vapor deposition on copper foil and transferred to glass substrates. Uncapped films possess charge-carrier mobilities of 2030 cm2/Vs at hole concentrations of 3.6 × 1012 cm−2. Graphene withstands the deposition and subsequent crystallization of silicon capping layers. However, the crystallinity of the silicon cap has large influence on the field-induced doping of graphene. Temperature dependent Hall-effect measurements reveal that the mobility of embedded graphene is limited by charged-impurity and phonon-assisted scattering.
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