Abstract

Understanding degradation mechanism is essential in improving performance and long-term stability of solid oxide fuel cells. Model cells consisting of porous La0.6Sr0.4Co0.2Fe0.8O3-δ (LSCF) cathodes were implemented on yttria-stabilized zirconia (YSZ) electrolytes with dense Gd-doped ceria (GDC) interlayers and tested in an open-circuit voltage condition at 800°C for 300 h in air to elucidate the degradation at the cathode-interlayer interfaces. The GDC films were prepared on poly-YSZ and single-crystal YSZ(100) electrolytes by pulsed laser deposition to generate dense and well-defined barrier microstructures namely granular polycrystalline (poly-GDC) and grain boundary-free single crystalline (sc-GDC) interlayers. Distinct features of the reaction phases at the cathode-interlayer interfaces were observed depending on the type of GDC interlayers. The severe SrZrO3 accumulation at the LSCF/poly-GDC interface caused the rapid cell performance degradation with the poly-GDC interlayers. Whereas, the SrZrO3 formation was suppressed successfully with the sc-GDC interlayers resulting in improved cell performance. However, the active reaction between cathode and interlayer results in the possible formation of GdFeO3 at the LSCF/sc-GDC interface and the CoO dissolution in sc-GDC interlayer appear to affect cell stability. Based on these results, plausible thermodynamic and kinetic considerations on interface chemistry and associated electrochemical behaviors were discussed.

Talk to us

Join us for a 30 min session where you can share your feedback and ask us any queries you have

Schedule a call

Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.