Abstract
Abstract : Ellipsometry is shown to provide a sensitive evaluation of the surface cleaning process based on in-situ and ex-situ studies of the cleaning of Si, Ge, and InP surfaces. Both single wavelengths and spectroscopic ellipsometry are shown to be applicable. The essential of the measurement and sample results are discussed. Ellipsometry, Surface cleaning
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have