Abstract
Reflection ellipsometry in visible and infrared range, which enables the analysis of isotropic thin films, is one approach that is extremely sensitive and accurate. There are a few restrictions with this technique when analyzing ultra-thin transparent film (UTTF) structures. In our study, the issue of the independent determination of two parameters of a transparent film that is extremely thin (d < 10 nm) is examined from the standpoint of the optimal conditions choosing for an ellipsometric experiment. An original method to calculation the errors in the main parameters of UTTF depending on the experimental conditions is proposed. One analyzed the influence of the substrate optical parameters and the incidence angle of light on the sensitivity of ellipsometric data. The analysis shows that under certain experimental conditions, the sensitivity of ellipsometric measurements allows to independently determine both the refractive index and the thickness of a transparent film down to 3 nm thick.
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