Abstract
Oxidized copper layers prepared in hydrogen peroxide for chemical mechanical polishing (CMP) have been characterized using spectroscopic ellipsometry. In the spectral analysis of the oxidized copper layers, Lorentz oscillator model is used. Lorentz model was assumed a graded layer based on glow discharge spectroscopy analysis, the precise optical constants and thickness of oxidized copper layers was determined. Its optical constants and FT-IR analysis indicate that the oxidized copper layers consist of CuO and voids. The proportion of void was increases with growth of the oxidized layers. These analyses are useful to investigate an advanced CMP process using organic acid.
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