Abstract
Spectral interferences from the presence of nearby matrix lines can occur when using continuum source background correction. An interference of this type exists when determining Se in nickel-base alloys using deuterium background correction. This interference introduces a significant analytic error at both the 196.0- and 204.0-nm Se lines. By comparison, Zeeman effect background correction is free of any spectral interference problem. Zeeman background correction, used in conjunction with the stabilized temperature platform furnace, permitted accurate analysis without the requirement for matrix-matched standards.
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