Abstract

A moderate power microwave-induced argon plasma operated at atmospheric pressure is evaluated as an ion source for mass spectrometry. Data are presented which illustrate a non-homogeneous distribution of the analyte ions throughout the plasma requiring sampling from a position where molecular oxide and hydroxide formation is favoured. Effects of sampling depth, plasma power and argon flow-rate on the ion signals are discussed. Major background ions present in the argon microwave induced plasma (Ar MIP) are similar to those encountered in the argon inductively coupled plasma (Ar ICP). Detection limits using this laboratory-built instrument, range from 7 to 70 ng ml–1 depending on the ionisation potential. The effects of concomitant elements are much more severe with the Ar MIP than with the Ar ICP using the same instrument.

Full Text
Paper version not known

Talk to us

Join us for a 30 min session where you can share your feedback and ask us any queries you have

Schedule a call

Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.