Abstract
This paper describes the fabrication of electrostatically deflectable structures using surface micromachining with chemical vapour deposition (CVD) polysilicon. Particular attention has been paid to the realization of torsional mirrors. Free-standing structures with a thickness of 1 μm are produced by lateral etching of a 2 μm sacrificial silicon dioxide layer deposited between the substrate and the CVD polysilicon layer. In order to avoid sticking of completely under-etched structures to the substrate, the polysilicon microstructures are fixed by a frozen solvent after etching of the sacrificial layer and rinsing; subsequently a sublimation process under vacuum is applied. The torsional mirrors are deflectable with voltages of about 20 V. The maximum deflection is approximately 2°. Several mirrors with different dimensions have been made. For comparing and optimizing their mechanical properties and behaviour during deformation, mirror designs are modelled using the finite-element program ANSYS.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
