Abstract
Carbon dioxide is one of the major green house gases as well as impurities in process gases used for various manufacturing industries. In the present work, our recently developed ionization separator (Ito et al., Ind. & Eng. Chem. Res., 42, 5617-5621, 2003) was applied to the separation of carbon dioxide from inert gases. As a result, it was found that carbon dioxide decomposes by the soft X-ray irradiation. The maximum efficiency of electrostatic separation of carbon dioxide was 14% when helium stream contains 2.4 ppm of carbon dioxide at the applied voltage of 600V and the separation efficiency was decreased with increase in the inlet concentration. The dependency of separation efficiency on the applied voltage was qualitatively explained by the separation model that accounted for the electrical migration, the generation and the neutralization of anions and cations formed from carbon dioxide.
Highlights
Reduction of carbon dioxide (CO2) concentration in air and other gases has been of great concern in various fields; e.g., control of indoor air quality by ventilation (Nabinger et al, 1994, Persily, 1997), green house effect (Hansen et al, 1981), contamination control of process gases for semiconductor manufacturing (Briesacher et al, 1991).Adsorption of CO2 with molecular-sieves and other adsorbents has been a common method for reducing CO2 concentration
The decomposition of CO2 may occur by the irradiation with soft X-ray in the ionization-separator
It was assumed that the net generation rates of CO2 cations and anion are proportional to the number of neutral CO2 molecules and that the depletion rates of CO2 anions and cations are proportional to the numbers of CO2 cations and anions without the decomposition of CO2
Summary
Reduction of carbon dioxide (CO2) concentration in air and other gases has been of great concern in various fields; e.g., control of indoor air quality by ventilation (Nabinger et al, 1994, Persily, 1997), green house effect (Hansen et al, 1981), contamination control of process gases for semiconductor manufacturing (Briesacher et al, 1991).Adsorption of CO2 with molecular-sieves and other adsorbents has been a common method for reducing CO2 concentration. Behaviors of ions, radicals and molecular species have been studied for the purpose of gas cleaning and purification from gas stream by corona discharge (Ohkubo et al, 1994), surface discharge (Oda et al, 1997) and electron beam injection (Hirota et al, 1995), etc. These methods using high discharge energy are not effective for lowering the concentration of CO2
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