Abstract
Fabrication of uniform thin coatings of multi-walled carbon nanotubes (MWCNTs) by electrophoretic deposition (EPD) on semiconductor (silicon) substrates with 3-aminopropyl-triethoxysilane (APTES) surface functionalization has been studied extensively in this report. The gradual deposition and eventual film formation of the carbon nanotubes (CNTs) is greatly assisted by the Coulombic force of attraction existing between the positively charged –NH2 surface groups of APTES and the acid treated, negatively charged nanotubes migrating towards the deposition surfaces. The remarkable deposition characteristics of the CNT coatings by EPD in comparison to the dip coating method and the influence of isopropyl (IPA)-based CNT suspension in the fabricated film quality has also been revealed in this study. The effect of varying APTES concentration (5%–100%) on the Raman spectroscopy and thickness of the deposited CNT film has been discussed in details, as well. The deposition approach has eliminated the need of metal deposition in the electrophoretic deposition approach and, therefore, establishes a cost-effective, fast and entirely room temperature-based fabrication strategy of CNT thin films for a wide range of next generation electronic applications.
Highlights
The invention of helical microtubules of graphitic carbon by Iijima in 1991 [1] by arc-discharge evaporation has stimulated stupendous research endeavors in the wondrous world of carbon nanotubes (CNTs) all over the world
The surface functionalization process on the silicon substrates has been accomplished by the self-assembly process of the APTES monolayer
Electrophoretic deposition (EPD) of acid refluxed carbon nanotubes from CNT-isopropyl alcohol (IPA) and CNT-water suspension has been successfully accomplished on silicon substrates with self -assembled organosilane (APTES) surface functionalization
Summary
The invention of helical microtubules of graphitic carbon by Iijima in 1991 [1] by arc-discharge evaporation has stimulated stupendous research endeavors in the wondrous world of carbon nanotubes (CNTs) all over the world. The applicability of electrophoretic deposition of carbon nanotubes in microelectronics and microelectromechanical systems (MEMS) can be multiplied profoundly through its deposition accomplishments on different semiconductor substrates, like silicon. In this respect, our research group recently investigated the deposition characteristics of MWCNTs on patterned metal films atop silicon substrates and insulating layers, such as silicon dioxide and silicon nitride [35]. The relevant sections of this report reveal extensive details pertaining to the preparation of CNT suspension for the intended EPD process, APTES self-assembly by the hydroxylation and silanization technique and different comparative studies on the influence of CNT-IPA and CNT-water suspension on the fabricated film quality and the benefits of EPD over dip coating methods with varying concentration of APTES
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