Electronic excitation induced modification in fullerene C70 thin films

Abstract

Fullerene C70 thin films were deposited by resistive heating on glass substrates and the thickness were approximated to be 150nm. The effect of energy deposition by 55MeV Si ions on the optical and structural properties of the prepared thin film samples is investigated. The samples were irradiated with 55MeV Si ions within fluence range from 1×1012 to 3×1013ions/cm2. For optical studies, the pristine and the Si ion irradiated samples are examined by UV–visible absorption spectroscopy and Raman spectroscopy. UV–visible absorption studies reveal that the absorption peaks of irradiated samples decrease with a decrease in the band gap of the thin films. The damage cross-section (σ) and radius of damaged cylindrical zone (r) are determined as ∼0.6×10−13cm2 and ∼1.41nm, respectively from the Raman spectra. Raman studies also suggest that at higher fluence (up to 3×1013ions/cm2), the damage caused by the SHI results in partial amorphization of fullerene C70 thin film. Modification in the surface properties has been investigated by atomic force microscopy; it has revealed that the roughness decreases and average particle size increases with the increase in fluences.