Electron spectroscopy from solid surfaces in UHV: a discussion of current progress with techniques involving electron (AES) photon (ESCA) and field stimulated electron emission

Abstract

The present status of AES, XPS (ESCA), APS, UPS, field emission energy analysis, LEED and RHEED is briefly surveyed. Three topics are then examined in more detail: (1) electron and photon induced core level ionization, and subsequent Auger processes, (2) measurement of electron energy distributions using retarding and bandpass analysers (CMA and hemispherical) and (3) quantitative interpretation of Auger and photoelectron line intensities. Emphasis is placed on the physical relationship that exists between AES, XPS and field emission, despite the separate and sometimes isolated development of these techniques. In particular the results of recent escape depth measurements underline the surface sensitivity of XPS (ESCA).