Electron mobility in polarization-doped Al0-0.2GaN with a low concentration near 1017 cm−3

Abstract

In this letter, carrier transport in graded AlxGa1-xN with a polarization-induced n-type doping as low as ∼1017 cm−3 is reported. The graded AlxGa1-xN is grown by metal organic chemical vapor deposition on a sapphire substrate, and a uniform n-type doping without any intentional doping is realized by linearly varying the Al composition from 0% to 20% over a thickness of 600 nm. A compensating center concentration of ∼1017 cm−3 was also estimated. A peak mobility of 900 cm2/V·s at room temperature is extracted at an Al composition of ∼7%, which represents the highest mobility achieved in n-Al0.07GaN with a carrier concentration of ∼1017 cm−3. A comparison between experimental data and theoretical models shows that, at this low doping concentration, both dislocation scattering and alloy scattering are significant in limiting electron mobility and that a dislocation density of <107 cm−2 is necessary to optimize mobility near 1016 cm−3. The findings in this study provide insights into key elements for achieving high mobility at low doping levels in GaN, a critical parameter in the design of novel power electronics taking advantage of polarization doping.