Abstract
ABSTRACTA candidate GeSi buffer layer structure suitable for strain-symmetrised GeSi/Si superlattice overgrowth is grown by molecular-beam epitaxy and its strain state characterised using microdiffraction in a dedicated scanning transmission electron microscope. The structure consists of five alloy layers of increasing Ge concentration grown on a Si (100) substrate, with all but the last annealed at high temperature. Analysis of higher order Laue zone deficit lines in the microdiffraction patterns acquired from each layer indicate that relaxation is complete in all the layers. Images of the structure in the transmission electron microscope show good crystallinity of the final layer with low concentrations of threading dislocations.
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