Abstract
ABSTRACTFor the first time we use fluctuation electron microscopy to study the effect of electron irradiation on amorphous silicon. Before showing the results, we compare two variable coherence methods, hollow cone and dark field. These techniques have been successfully implemented in the Philips CM12, JEOL 4000 and Hitachi 9000 microscopes. The image fluctuations for ion-implanted and vacuum-deposited amorphous silicon can be reliably measured under the conditions used in these microscopes.
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