Abstract
Different sp3 content diamond-like carbon films are deposited on to highly n-doped Si(111) substrates by a new plasma deposition technique-filtered arc deposition. Their electron field emission properties are studied by using a simple diode structure. It is showed that the turn-on field is decreased and field emission current density is increased with the increasing sp3 content (75-80%, 80-83%, and 88-90%) of the films. Field emission current of 0.1 μA from the three samples was detected under the electric field of 10.1, 5.6, and 2.9 V/μm and emission current density of 4.4, 15.2, and 43.2 μA/cm2, respectively, under 14.3 V/μm. Fowler-Nordheim (F-N) plots of the three samples nearly show of lineaity indicating that electron field emission obeys F-N theory.
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