Abstract
Electron energy-loss spectrometry in the transmission electron microscope is used to directly assess the nature of bonding at interfaces formed during alternating deposition of nanoscale Ni and SiO2 multilayers. Interfacial Ni–O bond formation near the interface is revealed by energy-loss near-edge structure preceding the OK edge threshold, indicating hybridization of O2p with Ni3d orbitals, and by characteristic white line structure associated with the NiL2,3 edge. Interface spectra are compared to reference NiO spectra, verifying local Ni–O bonding at the Ni∕SiO2 interface.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
