Abstract
Electron energy-loss spectrometry in the transmission electron microscope is used to directly assess the nature of bonding at interfaces formed during alternating deposition of nanoscale Ni and SiO2 multilayers. Interfacial Ni–O bond formation near the interface is revealed by energy-loss near-edge structure preceding the OK edge threshold, indicating hybridization of O2p with Ni3d orbitals, and by characteristic white line structure associated with the NiL2,3 edge. Interface spectra are compared to reference NiO spectra, verifying local Ni–O bonding at the Ni∕SiO2 interface.
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