Electron energy loss and Auger study of epitaxially grown Cu on Ni(100)

Abstract

Auger and electron energy loss spectra have been measured on films of Cu epitaxially grown on Ni(100). The films were prepared under UHV conditions using a quartz crystal for monitoring the deposition rate. LEED measurements were taken to determine the orientation of the films. The presence of a monolayer of Cu on Ni(100) is enough to suppress the 3p-3d transition on the surface of the sample. The electron energy loss spectra were studied as a function of the primary electron energy (50 to 300 eV). The experimental results were qualitatively analyzed using recent theoretical calculations of Cooper and co-workers. The effect of a small Cu coverage on Ni(100) on the chemisorption of CO and O 2 was also studied. A strong suppression of CO chemisorption at room temperature was observed. In the case of O 2, large exposures are necessary in order to observe a significant amount of oxygen on the surface. The absence of any appreciable chemisorption on the surface of the metal is attributed to the lack of empty d-surface states.