Abstract
Electron emission of cathode holder of vacuum diode of an intense electron-beam accelerator and its effect on the output voltage
Highlights
Pulsed-power technology has been used in many fields, such as high-power microwave (HPM) generation [1,2,3,4], Z pinch [5,6,7,8], electron-beam pumped high-power laser [9,10], ion implantation for material modifications [11], and so on
EXPERIMENTAL SETUP The experiment is performed on an intense electron-beam accelerator (IEBA) which is designed by our laboratory [17], and it is capable of generating a quasi-square wave with voltage of 200–500 kV by adjusting the gas pressure of the main switch, and full width at half maximum (FWHM) of 180 ns when connected to impedance matched load
The water load is placed in the vacuum chamber, and no insulation plate is added between the cathode holder and bottom plate of the water load
Summary
Pulsed-power technology has been used in many fields, such as high-power microwave (HPM) generation [1,2,3,4], Z pinch [5,6,7,8], electron-beam pumped high-power laser [9,10], ion implantation for material modifications [11], and so on. The typical pulse power facility for the electron-beam pumped high-power laser is Naval Research Laboratory’s Electra generator with 140 ns FWHM, 500 kV voltage, and 110 kA current [9], which is used to pump He–Ar, Ar–Xe, XeCl, XeF, ArF, and KrF lasers [13]. In these applications, the vacuum diodes are among the most important parts of the pulsed-power modulator. To improve the quality of the electron beams, the output voltage of these pulse power facilities is very important, because the quality of the electron beams is directly
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