Abstract
Abstract A number of diamond films, 0.2 to 4 microns thick, have been grown on Si and Mo substrates by the well-established arc-discharge plasma chemical vapour deposition procedure The photoemission properties of the films were studied according to the technique developed previously for investigations of metal photocathodes. The samples placed in 10-6 Torr vacuum were illuminated by a softly focused either XeCl or KrCl excimer laser beam of 4.02 and 5.6 eV photon energies, respectively. These values are smaller and larger than the gap value of a natural diamond (5.5 eV).
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