Abstract

We present total yields for emission of slow (${\mathit{E}}_{\mathit{e}}$\ensuremath{\le}50 eV) electrons due to the impact of slow (${\mathit{v}}_{\mathit{p}}$\ensuremath{\le}5\ifmmode\times\else\texttimes\fi{}${10}^{5}$ m/s) highly charged ions [${\mathrm{Ar}}^{\mathit{q}+}$ (q\ensuremath{\le}18), ${\mathrm{Xe}}^{\mathit{q}+}$ (q\ensuremath{\le}51), and ${\mathrm{Th}}^{\mathit{q}+}$ (q\ensuremath{\le}80)] on clean polycrystalline gold. The highly charged ions were produced in the Lawrence Livermore National Laboratory electron-beam ion trap; electron yields have been derived from the respective measured electron emission statistics. The experimental data support a currently accepted scenario for multicharged ion-induced electron emission, which is largely based on a classical over-barrier model. In particular, we are able to distinguish different processes contributing to the total above-surface electron emission. In addition, an ultimate low-impact-energy limit due to projectile self-acceleration toward the metal surface, as a result of the projectile image charge, has been demonstrated and evaluated.

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