Abstract
The epitaxy of evaporated Cu films on Cu single crystals has been investigated in situ under high-vacuum conditions with reflection HEED techniques. Spherically shaped Cu single crystals with high quality surfaces were used as substrates. The effects of condensation temperature and the annealing behavior were studied for the main low-index planes. A completely developed twin orientation of the film was found in all cases. For films deposited at room temperature the diffraction diagrams additionally contained a complete set of double diffraction spots.
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