Abstract
A new electron cyclotron resonance (ECR) plasma source has been developed for broad ion-beam processing. A Ku-band traveling-wave tube amplifier (11–13GHz) is adopted to generate high-density plasma under low-pressure conditions. An eight-pole magnetic field is selected to improve good uniformity and plasma confinement. The ECR zone for 11GHz microwaves, i.e., 0.393T, is formed within 6.5mm of the inner wall of a chamber. The ECR plasma is generated by low microwave power (∼200W). The radial profile of plasma density and electron temperature is measured with a Langmuir probe. The plasma density is approximately 3×1017m−3 at the microwave power of 200W. The uniformity of the density is within ±12.6% over 140mm in diameter.
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