Abstract
In the Mask D2I project at ASET, the authors designed a novel electron beam exposure system having the concepts of multicolumn cell (MCC), character projection, and variable shaped beam to improve the throughput of electron beam exposure systems. They presented the electron optical structure of an individual column cell in the MCC and have shown shaped beam performances in the column cell. They evaluated the impacts on beam position in one column cell caused by deflections of major and minor deflectors in other column cell, which were less than 2.5nm for both averaged and transitional impacts between +full and −full deflections. They will improve the evaluation accuracy to analyze the origin of the impacts and decrease the impacts from other column cell.
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