Abstract
Some characteristics of a technique for accelerated particle beam monitoring are presented. This technique for beam current and pulse duration measurement is based on the electron beam pumped semiconductor laser (EBP-laser) principle of operation. Experimental investigations of a 300- mu m GaAs primary probe were carried out. Accelerated electron beam pulses with current range 50-500 A, pulse duration 5 mu s, and energy 200 keV were registered. The system sensitivity in this current range was 5*10/sup -3/ V/A. >
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