Electron beam projection nanopatterning using crystal lattice images obtained from high resolution transmission electron microscopy

Abstract

The fabrication of nanometer-scale features such as quantum dots and quantum wires, in a controllable and economically viable manner is one of essential requirements for the production of highly functional devices. Here, we propose a new electron beam projection lithography technique for patterning nanometer scale, periodic structures. The novelty of this technique is that the crystalline lattice image observed by high resolution transmission electron microscopy (HRTEM) is employed as the ultimate mask to define nanometer scale pattern. Namely, the Angstrom-scale lattice image of a crystalline material is magnified within the electron microscope, and is projected onto an electron-beam-resist-coated substrate. This technique is tentatively called AIPEL (atomic image projection electron-beam lithography).