Electron Beam Lithography

Abstract

This chapter shows the range of electron beam lithography applications as it relates to the environment of a research laboratory. The multitude of tools available—Gaussian round beam, variable shape beam, thermal field emitter Gaussian round beam, and mask makers—provide full coverage of device technology support today. Optical lithography is the technology of choice for manufacturing of chips, mainly for economic reasons. Electron beam lithography cannot compete in terms of number of chips produced, but it has many other key features that turn out to be of great value in the device development environment. The idea of using a focused electron beam to create binary images for device fabrication of very small dimensions originated from the principle of the scanning electron microscope. In research applications, where electron beam lithography is most suited, system resolution and accuracy are of primary concern.