Abstract
Asymmetric transmission gratings operating in the resonance domain are designed by modeling of the dose-controlled electron-beam lithography process with Gaussian convolution. We aim to exceed some efficiency limit eta(s) over a specified spectral range and to maximize eta(s). The resultant continuous-profile gratings are fabricated by electron-beam lithography and proportional reactive-ion etching into SiO(2). We demonstrate gratings with good signal-to-noise ratio and a diffraction efficiency greater than 40% for wavelengths from 400 to 750 nm.
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