Electron-beam–controlled deflection of near-infrared laser in semiconductor plasma

Abstract

A timing method for experiments on the interaction of a near-infrared laser and an ultra-relativistic electron beam via a semiconductor plasma switch is experimentally validated. As an intermediate medium, a thin Si plate is excited by the energetic, intense electron beam to produce a semiconductor plasma, which in turn deflects counter-colliding laser light having 1 μm wavelength. An electron beam of sub-nC charge sufficiently induces the needed electron number density gradient of 1 × 1020 cm−3 per tens of μm length at the interaction point. Demonstration during an inverse Compton scattering experiment by a counter-colliding electron beam of 300 pC and 70 MeV with an Nd: YAG laser at a wavelength of 1 μm is reported.