Abstract
The structure of thin sputter-deposited chromium films was investigated by electron and X-ray diffraction. Deposition at room temperature under convinient deposition conditions (oxygen partial pressure, film thickness) led to the evolution of a (110) fibre texture, while films deposited at 200 °C exhibited a well-developed (001) texture. Increasing oxygen partial pressure provided polycrystalline films. Under distinct deposition conditions an A-15 structure type of diffraction pattern could be observed. This is caused by a chromium-oxygen phase, probably Cr 3O. With increasing substrate temperature as well as with increasing oxygen content the direction of internal stress changed from tensile to compressive with respect to the film plane. The stress relaxed after annealing under high vacuum conditions.
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