Abstract
We investigated the electron-stimulated desorption (ESD) and photon-stimulated desorption (PSD) from the NO adsorbed Si(111) surface. In the ESD experiment done at room temperature, the observed ion species were H+ and O+. In addition, N+ was observed for the first time in the ESD experiment at 190 K. We found two types of N+ which had different kinetic energies. From the ion angular distribution patterns, these two types were attributed to two adsorption sites of NO: the bridge and on-top sites. In the PSD experiment at 90 K, NO+, O+2 and N2O2+ were observed for the first time in addition to the H+, O+ and N+ ions. As for N+, we found two TOF peaks corresponding to the different kinetic energies revealed by the ESD experiment. From the photon energy dependence of the PSD experiment and the UPS spectra, we interpreted that the desorption of N+ took place from the molecularly adsorbed NO for the excitation of the 3σ molecular orbital (mainly O 2s).
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
