Abstract
Abstract The step-by-step experimental investigations of mechanisms of interrelated processes in electronic and atomic subsystems on UV-VIS illuminated surface of wide-bandgap oxides are presented. A variety of complementary experimental methods such as mass-spectrometry, optical and ESR spectroscopies and UV-photoelectron spectroscopy have been adapted to carry out in situ investigations in three phases: gas-adsorbate-surface. The spectral selective and site sensitive excitation of intrinsic anion and cation vacancies in the sub-bandgap range of photon energy is discussed. The kinetic parameters of three channels of surface relaxation: radiative, non-radiative and chemi-relaxation are measured. The structure of photoadsorbed species is determined. The potentialities to regulate the number and composition of surface defects and their use for “self-sensitization” of real photocatalysts are demonstrated.
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