Abstract
Photoluminescence, capacitance-voltage and transmission electron microscopy studies have been carried out on structures containing a sheet of a self-assembled InAs quantum dots formed in GaAs matrices after the deposition of a 1.7 ML of InAs at 480°C. The use of n- and p-type GaAs matrices allows us to study separately electron and hole levels in the quantum dots by the capacitance-voltage technique. From analysis of photoluminescence and capacitance-voltage measurements it follows that the quantum dots have electron levels 80 meV below the bottom of the GaAs conduction band and two heavy-hole levels at 100 meV and 170 meV above the top of the GaAs valence band.
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