Abstract
Al films were subjected to DC and AC currents at various current densities in high and low ambient temperatures to cause migration in the films. The results were compared with the predictions of Pai and Marton regarding the direction of migration, its reversal near the melting point, the position and time dependence of migration, and other features. The agreement between theory and experiment was found reasonable, and the numerical values of migration and material constants obtained from the analysis were consistent. The work shows that a quantitative analysis of electromigration data is possible and the results are valuable.
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