Abstract
The paper presents the results of experimental studies and analysis of the dynamics of heating of metal-dielectric structures (MDS) with aluminum conducting films on glass or sitall substrates when exposed to powerful microwave fields, as well as when exposed to direct and alternating currents. An abnormally high temperature increase was found for a conducting film with a thickness of 5-10 nm, which occurs only when exposed to microwave fields. Comparative analysis has shown that when exposed to microwave fields, the temperature dependences on the thickness of the conducting film and the time of exposure differ diametrically from similar dependences at direct or alternating currents.
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