Abstract

Three solutions with a basic content orthophosphoric acid and solvents water, methyl alcohol and ethylene glycol are developed for electropolishing of metallographic specimens of Cu and a large number of Cu alloys with different chemical and phase compositions. After an estimation of the polished surface quality with the optical microscope and analysis of the current density-voltage curves the optimal conditions for electropolishing are established. Bright polished, defect-free surfaces are obtained

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